THIN FILM DEPOSITION APPARATUS

摘要

PURPOSE: A thin film deposition device is provided to form an even thin film on a whole surface of a substrate by forming plural substrate supporting members with materials having good thermal and mechanical properties. CONSTITUTION: A substrate loading-unloading frame(120) is installed inside a process chamber to support plural substrates loaded from the outside or unloaded to the outside. A susceptor(140) supports the substrates supported by the substrate loading-unloading frame according to elevation or places the substrates on the substrate loading-unloading frame. A substrate supporter supports corners in each substrate supported by the substrate loading-unloading frame.