发明名称 Methods of utilizing block copolymers to form patterns
摘要 Some embodiments include methods of forming patterns utilizing copolymer. A copolymer composition is formed across a substrate. The composition includes subunits A and B, and will be self-assembled to form core structures spaced center-to-center by a distance of L0. The core structures are contained within a repeating pattern of polygonal unit cells. Distances from the core structures to various locations of the unit cells are calculated to determine desired distributions of subunit lengths.
申请公布号 US8268732(B2) 申请公布日期 2012.09.18
申请号 US20090621768 申请日期 2009.11.19
申请人 SILLS SCOTT;MICRON TECHNOLOGY, INC. 发明人 SILLS SCOTT
分类号 H01L21/312 主分类号 H01L21/312
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