发明名称 |
Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element |
摘要 |
A bis(aminophenol) derivative having substituents at positions adjacent to two amino groups is provided. The bis(aminophenol) derivative is used as a raw material of a polyamide resin for a positive-tone photosensitive resin composition. A polyamide resin comprising bis(aminophenol) and a structure derived from a carboxylic acid is also provided, the bis(aminophenol) having substituents at positions adjacent to the two amino groups. A positive-tone photosensitive resin composition comprising a polybenzooxazole precursor resin, exhibiting high sensitivity and a high cyclization rate even when cured at a low temperature is provided. Also provided is a positive-tone photosensitive resin composition comprising a polyamide resin having an imide structure, an imide precursor structure, or an amide acid ester structure. The composition exhibits high sensitivity and produces a cured product having low water absorption even when cured at a low temperature. |
申请公布号 |
US8269358(B2) |
申请公布日期 |
2012.09.18 |
申请号 |
US20070446751 |
申请日期 |
2007.10.23 |
申请人 |
TERAKAWA KOJI;SUMITOMO BAKELITE COMPANY LIMITED |
发明人 |
TERAKAWA KOJI |
分类号 |
H01L23/29;C07C211/55;C08G65/38;G03F7/004 |
主分类号 |
H01L23/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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