SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PURPOSE: A resist composition containing acid generator with salt and resin is provided to prepare a resist pattern with excellent margin of focus(DOF). CONSTITUTION: A salt is denoted by chemical formula I. An acid generator contains the salt of chemical formula I. A resist composition contains the acid generator and resin. The resin is non-soluble and insoluble in an alkali solution and is dissolved in alkaline solution. The resist composition further contains a base compound and solvent. A method for preparing the resist pattern comprises: a step of applying a substrate with a resist composition; a step of drying the composition and forming a composition layer; a step of exposing the composition layer; a step of heating and developing the composition layer.