CMP PAD CONDITIONER DISC

摘要

PURPOSE: A CMP(Chemical Mechanical Polishing) pad conditioner is provided to enable to reduce an economic loss caused by discarding a polishing plate if the polishing plated is made of materials relatively cheap such as engineering plastics. CONSTITUTION: A CMP pad(1) conditioner comprises a conditioner shank(2) and a polishing plate(4). The conditioner shank is formed into a plate shape. The polishing plate is attached on a front surface of the conditioner shank by an adhesive. The polishing plate comprises a fastener being coupled by passing through the conditioner disc. The polishing plate comprises a plate shaped plastic substrate.