发明名称 Bipolar transistor including conductive first and second protection layers
摘要 A bipolar transistor at least includes a semiconductor substrate including an N− epitaxial growth layer and a P− silicon substrate, an N+ polysilicon layer, a tungsten layer, two silicide layers, a base electrode, an emitter electrode, and a collector electrode. The N+ polysilicon layer formed on the semiconductor substrate is covered with one of the silicide layers. The tungsten layer that is formed on the silicide layer is covered with the other silicide layer.
申请公布号 US8269313(B2) 申请公布日期 2012.09.18
申请号 US20100662148 申请日期 2010.04.01
申请人 MATSUOKA AKIO;RENESAS ELECTRONICS CORPORATION 发明人 MATSUOKA AKIO
分类号 H01L27/082;H01L27/102;H01L29/70;H01L31/11 主分类号 H01L27/082
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