发明名称 |
Formation of a device using block copolymer lithography |
摘要 |
The formation of a device using block copolymer lithography is provided. The formation of the device includes forming a block copolymer structure. The block copolymer structure includes a first polymer and a second polymer. The block copolymer structure also includes a first component deposited between adjacent blocks of the first polymer and a second component deposited between adjacent blocks of the second polymer. A template is developed by removing either the first and second polymers or the first and second components from the block copolymer structure. The formation of the device also includes lithographically patterning the device utilizing the block copolymer structure template. The device may be a data storage medium. |
申请公布号 |
US8268545(B2) |
申请公布日期 |
2012.09.18 |
申请号 |
US20080135387 |
申请日期 |
2008.06.09 |
申请人 |
XIAO SHUAIGANG;YANG XIAOMIN;SEAGATE TECHNOLOGY LLC |
发明人 |
XIAO SHUAIGANG;YANG XIAOMIN |
分类号 |
G03F7/26 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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