发明名称 |
Method and apparatus for cleaning substrates |
摘要 |
Provided is an apparatus for cleaning and drying a substrate by applying a plurality of chemicals and gases to the substrate. The apparatus may include: a substrate support member including a chuck receiving a substrate; a first nozzle member injecting a drying fluid onto a top surface of the substrate for drying the substrate; a low cover including an opened top and enclosing the chuck; and an upper cover selectively closing the opened top of the low cover so as to dry the substrate in a closed space. Therefore, the apparatus dries a substrate more efficiently and protects the substrate from being contaminated by foreign pollutants. Furthermore, generation of an undesired oxidation layer on the substrate can be prevented. |
申请公布号 |
US8267103(B2) |
申请公布日期 |
2012.09.18 |
申请号 |
US20070796885 |
申请日期 |
2007.04.30 |
申请人 |
PARK KEUN-YOUNG;KOO KYO-WOOG;SEMES CO. LTD |
发明人 |
PARK KEUN-YOUNG;KOO KYO-WOOG |
分类号 |
B08B3/00 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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