发明名称 |
Substrate holding apparatus, polishing apparatus, and polishing method |
摘要 |
A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member. |
申请公布号 |
US8267746(B2) |
申请公布日期 |
2012.09.18 |
申请号 |
US20080222909 |
申请日期 |
2008.08.19 |
申请人 |
YASUDA HOZUMI;TOGAWA TETSUJI;NABEYA OSAMU;SAITO KENICHIRO;FUKUSHIMA MAKOTO;INOUE TOMOSHI;EBARA CORPORATION |
发明人 |
YASUDA HOZUMI;TOGAWA TETSUJI;NABEYA OSAMU;SAITO KENICHIRO;FUKUSHIMA MAKOTO;INOUE TOMOSHI |
分类号 |
B24B47/02;B24B37/005;B24B37/04;B24B37/30;B24B49/10;H01L21/304 |
主分类号 |
B24B47/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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