发明名称 Alternative to desmear for build-up roughening and copper adhesion promotion
摘要 In some embodiments, an alternative to desmear for build-up roughening and copper adhesion promotion is presented. In this regard, a substrate in introduced having a dielectric layer, a plurality of polyelectrolyte multilayers on the dielectric layer, and a copper plating layer on the polyelectrolyte multilayers. Other embodiments are also disclosed and claimed.
申请公布号 US8268724(B2) 申请公布日期 2012.09.18
申请号 US20090619369 申请日期 2009.11.16
申请人 JOMAA HOUSSAM;TSAU CHRISTINE;INTEL CORPORATION 发明人 JOMAA HOUSSAM;TSAU CHRISTINE
分类号 H01L21/44 主分类号 H01L21/44
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