摘要 |
PURPOSE: A reactive ion etching apparatus and a method for texturing a solar battery using the same are provided to enhance efficiency of texturing by executing chemical etch and physical etch with a single process and forming a complex etching structure on the surface of the solar battery. CONSTITUTION: A thin film is evaporated on the substrate of a solar battery. The thin film is composed of SiO2. The thickness of a thin film which is evaporated is more than 3000Å. A pattern is transferred on the upper side of the thin film. The thin film is isotropically etched using a transferred pattern as mask. The thin film is anisotropically etched using the transferred pattern as mask. Isotropic etching and anisotropic etching are executed in a reactive ion etching apparatus. |