| 摘要 |
[Object] To provide a vacuum processing apparatus capable of suppressing the diffusion of an electron beam even in a high vacuum region, preventing an evaporation rate from being reduced, and performing stable film formation. [Solving Means] A vacuum processing apparatus (vapor deposition apparatus) (1) includes a vacuum vapor deposition chamber (50), an electron gun (20), and an electron beam focusing mechanism (150). The vacuum vapor deposition chamber (50) is provided with an evaporation source that houses an evaporation material (31), and a member to be processed (10) obtained by heating the evaporation material (31) to be vapor-deposited as a vapor-deposited film. The electron gun is arranged adjacently to the vacuum vapor deposition chamber (50) and emits an electron beam to heat the evaporation material (31). The electron beam focusing mechanism (150) is provided within the vacuum vapor deposition chamber (50) and focuses the electron beam emitted from the electron gun 20. |
