ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

The lighting device has a depolarizer (10) causes a linear polarized light in connection with a light mixture system following light direction of propagation in an effective depolarization on the depolarizer. A micro lens array (20) is arranged in light direction of propagation before the light mixture system, where multiple micro lenses (20a to 20e) are arranged with a periodicity. The depolarizer is formed in such a manner that by reciprocal effect of the depolarizer with the periodicity of the micro lens array results in remainder polarization distribution to a maximum polarization degree. Independent claims are also included for the following: (1) a method for micro lithographic production of micro-structured element (2) a micro-structured element.