发明名称 Forming wiring pattern by laser irradiation, comprises e.g. coating light-sensitive material on substrate to form light-sensitive layer and irradiating laser beam on substrate to form pattern including exposed region and unexposed region
摘要 <p>Forming a wiring pattern by laser irradiation (S1), comprises: coating a light-sensitive material on a substrate (S11) to form light-sensitive layer; irradiating a laser beam on light-sensitive material of the substrate to form a pattern which includes an exposed region and unexposed region (S13); and forming metallic wiring pattern by placing substrate into a solution having many metallic nanoparticles (S15), where the metallic nanoparticles are attached to the exposed region, and a molecular structure of the light-sensitive material in the exposed region is changed by laser irradiation.</p>
申请公布号 FR2972596(A1) 申请公布日期 2012.09.14
申请号 FR20110051866 申请日期 2011.03.08
申请人 CRETEC CO., LTD. 发明人 HO CHIEN-HAN;HUANG HUA-MIN
分类号 H05K3/02 主分类号 H05K3/02
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