| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a wafer processing apparatus which is capable of suppressing flow fluctuation of a processing liquid. <P>SOLUTION: A wafer processing apparatus 1 comprises a spin chuck 2 which holds a wafer W, and a processing liquid supply nozzle 3 which supplies a processing liquid to the wafer W. The processing liquid is stored in a processing liquid tank 5, and processing liquid supply piping 4 is provided between the processing liquid tank 5 and the processing liquid supply nozzle 3. In a middle portion of the processing liquid supply piping 4, a pump 6, a temperature control heater 7 and a filter 8 are provided. Processing liquid feedback piping 12 is branch-connected to a branch part J1, and the processing liquid feedback piping 12 is led to the processing liquid tank 5. In the processing liquid supply piping 4 at a downstream side rather than the branch part J1, a supply flow rate adjusting valve 9, a flowmeter 10 and a supply valve 11 are interposed. To a branch part J2 between the supply flow rate adjusting valve 9 and the flowmeter 10, processing liquid branch piping 15 is branch-connected, and an orifice 16 is provided in the processing liquid branch piping 15. <P>COPYRIGHT: (C)2012,JPO&INPIT |
