SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
摘要
A salt represented by the formula (I) and a resist composition containing the salt are provided, wherein Q1, Q2, L1, ring W1, Re1, Re2, Re3, Re4, Re5, Re6, Re7, Re8, Re9, Re10, Re11, Re12, Re13 and Z are defined in the specification.
申请公布号
US2012231392(A1)
申请公布日期
2012.09.13
申请号
US201213414267
申请日期
2012.03.07
申请人
YAMAGUCHI SATOSHI;ICHIKAWA KOJI;SUMITOMO CHEMICAL COMPANY, LIMITED
