VAPOR DEPOSITION APPARATUS

摘要

This vapor deposition apparatus is provided with a measuring means that is capable of measuring a state of a substrate at high accuracy. The apparatus is a rotation/revolution type vapor deposition apparatus having, in a chamber, a susceptor and a plurality of substrate holding members. The outer surface of a laser light transmitting section that is provided in the chamber has fixed thereon a measuring means which is provided with: a laser light source that continuously radiates laser light in the perpendicular direction to the surface of a substrate, which is held by the substrate holding members, and which rotates and revolves when the susceptor rotates; and a light receiving section, which receives laser light reflected by the surface of the substrate. Furthermore, the outer surface is provided with a determining means, which determines that the substrate is in an abnormal state when a change quantity of the reflected light received by the light receiving section is larger than a change quantity previously set.