SUBSTRATE WASHING SYSTEM, SUBSTRATE WASHING METHOD, APPARATUS FOR MANUFACTURING DISPLAY DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To decrease the number of washing processes, and additionally to prevent the re-attachment of contaminant particles to a substrate.

SOLUTION: A substrate washing system 1 includes a conveying part 2 that conveys the substrate W, and a supply nozzle 3 that supplies a washing liquid, having oxidative gas in a state of dissolved and of microbubbles in an oxide film-removable liquid, to a washing surface S of the substrate W conveyed by the conveying part 2. The supply nozzle 3 supplies the washing liquid at a flow velocity at which microbubbles reached on the washing surface S move to the periphery of the substrate W suppressing a size change.

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