发明名称 SILICON-CONTAINING FILM FORMING COMPOSITION, FORMING METHOD OF IMPURITY DIFFUSION LAYER AND SOLAR CELL
摘要 <P>PROBLEM TO BE SOLVED: To improve tight adhesiveness, to a hydrophilic substrate, of a composition containing a siloxane polymer which has no polar group in a side chain. <P>SOLUTION: A silicon-containing film forming composition contains a siloxane polymer (A) having a ring structure in a side chain, a polar low molecular weight compound (B) and a solvent (C). The siloxane polymer (A) has a constitutional unit represented by formula (a-2). As the polar low molecular weight compound (B), there is basic amine such as secondary or tertiary alcohol amine or alkylamine. As the solvent (C), any solvent is available if it is capable of dissolving the siloxane polymer (A). <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012178549(A) 申请公布日期 2012.09.13
申请号 JP20120000833 申请日期 2012.01.05
申请人 TOKYO OHKA KOGYO CO LTD 发明人 YOSHII YASUHIRO;TAKAHASHI MOTOKI;HIRAI TAKAAKI
分类号 H01L21/225;H01L21/22;H01L31/04 主分类号 H01L21/225
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