| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure unit and a prealignment of wafer in which a tact time can be shortened by mounting a wafer on a work chuck of an exposure device in a short time and accurately without providing any dedicated prealignment apparatus. <P>SOLUTION: A robot 17 holds a wafer W on a wafer placing table 25 and conveys the wafer from a processing unit 14 to an exposure device 15. For the wafer W being held on the wafer placing table 25, notches 28a, 28b and 29 provided on two sides 26 and 27 which are orthogonal with each other are detected by sensors 30a, 30b and 30c. On the basis of a deviation amount calculated from detection results and a predetermined reference position, the wafer placing table 25 is moved in X, Y and Z directions and rotated in a θ direction by a control section 18, thereby prealigning the wafer W. <P>COPYRIGHT: (C)2012,JPO&INPIT |
