NANOIMPRINTING METHOD AND NANOIMPRINTING APPARATUS FOR EXECUTING THE NANOIMPRINTING METHOD

摘要

[Objective] To realize pressing of a mold against a surface coated with curable resin at a uniform pressure to suppress the generation of fluctuations in residual film, in nanoimprinting that employs a mesa type mold and/or a mesa type substrate. [Constitution] In a nanoimprinting method, an assembly (8), of which the entire surface is directly exposable to the environment, is supported by a pressure vessel (110) by a support member (140) such that fluid pressure (P) from the environment operates on the entire surface of the assembly (8). Gas is introduced into the pressure vessel (110), and fluid pressure (P) exerted by the gas presses a mold (1) and a substrate (7) against each other.