BLANKMASK, PHOTOMASK AND METHOD OF MANUFACTURING THE SAME

摘要

PURPOSE: A blank mask, a photo-mask, and a method for manufacturing the same are provided to improve resolution and pattern accuracy. CONSTITUTION: A metal film and a hard film are successively stacked on a transparent substrate to form a blank mask. The metal film includes a light shielding film and an anti-reflective film. The thickness of the metal film is in a range between 200 and 500 angstrom. The metal content of the light shielding film is higher than the metal content of the anti-reflective film. The thickness ratio of the metal film to the hard film is 1:8.7-12.5. The reflectivity of the hard film to the metal film is 1.2 or more at a wavelength of 200nm or less.