| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a partition structure and an inner wall substrate construction method that prevent unevenness from being formed at least at a lower part of an attachment surface of an inner wall substrate. <P>SOLUTION: The width W1 of a stud 14 is set to be substantially the same as a width W2 of a ceiling runner 11 and a floor runner 12. The longitudinal size of the plates 20, 22 of bases 16, 18 to be attached to the ceiling runner 11 and the floor runner 12 is set to be substantially the same as the width W2 of the ceiling runner 11 and the floor runner 12. Outer shapes of the mounting parts 24, 26 of the bases 16, 18 are formed so as to be slightly smaller than an inner wall surface 14A of the stud 14. The stud 14 can be mounted on the mounting parts 24, 26. With such configuration, no unevenness is formed between the side surfaces 11A and 12A of the ceiling runner 11 and the floor runner 12A and the surface of a side wall part 14D of the stud 14. <P>COPYRIGHT: (C)2012,JPO&INPIT |
