| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing apparatus provided with an enhanced pad contact element which is capable of swiftly increasing a surface temperature of a polishing pad to a target temperature. <P>SOLUTION: A pad temperature regulation mechanism is equipped with a pad contact element 11 which is in contact with the surface of the polishing pad 3 and a liquid supply system 30 which supplies temperature-controlled liquid to the pad contact element 11. The pad contact element 11 is equipped with a first liquid flow passage 21 and a second liquid flow passage 22 inside thereof which are connected in series. A plurality of baffles 25 that extend approximately perpendicular to the radius direction of a polishing table 2 are placed on each of the first liquid flow passage 21 and the second liquid flow passage 22. <P>COPYRIGHT: (C)2012,JPO&INPIT |
