| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure pattern dimensions with high accuracy even when a surface is charged due to the emission of electronic rays of light. <P>SOLUTION: This pattern measurement device includes: an electronic ray source and beam deflection mechanism; a mechanism for scanning and emitting normal quantity of electrons to a normal position on a substrate to be measured, and for detecting secondary electrons emitted from the surface of the substrate by a detector; and a mechanism for configuring a secondary electronic image from the number of electrons input to the detector. This pattern measurement device includes means for correcting the fluctuation of a measurement value due to the influence of charge on the basis of the difference information of continuously acquired images. <P>COPYRIGHT: (C)2012,JPO&INPIT |
