| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus consistently generating plasma above a substrate. <P>SOLUTION: The thin film deposition apparatus for depositing a thin film on a substrate includes a film deposition vessel having a film deposition space for depositing the thin film on the substrate in a vacuum state, a gas introducing part for introducing gas to be used for thin film deposition into the film deposition space of the film deposition vessel, and a plasma electrode part for generating plasma by using the gas in the film deposition space. The plasma electrode part includes a rectangular plasma generating electrode plate in which the current flows from one end face to the other end face, and a principal surface is directed to the film deposition space, and a pair of magnets which are juxtaposed along a side surface of the electrode plate so as to hold the electrode plate from both side surfaces and of which the ends directed to the film deposition space have polarities different from each other. <P>COPYRIGHT: (C)2012,JPO&INPIT |
