发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To accurately drive a mobile. <P>SOLUTION: In an encoder system, a wafer stage WST holding a wafer W and moving within a predetermined plane and moving scales 44A-44D disposed practically in parallel with the inside of the predetermined plane are irradiated with beams from a direction crossing the predetermined plane, respectively, via a plurality of heads 48a-48k, thereby measuring positional information of the wafer stage WST. In a control system, the wafer stage WST is controlled on the basis of the measured information of the encoder system. The number of a plurality of heads 48a-48k confronted with the moving scales 44A-44D, among the plurality of heads 48a-48k, is changed by the encoder system and the control system, and among the plurality of heads 48a-48k, a head to be used for measuring positional information is switched to another head by moving the wafer stage WST. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012178570(A) 申请公布日期 2012.09.13
申请号 JP20120078982 申请日期 2012.03.30
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;G01B11/00;G03F7/20;H01L21/68 主分类号 H01L21/027
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