发明名称 |
METAL CAP FOR BACK END OF LINE (BEOL) INTERCONNECTS, DESIGN STRUCTURE AND METHOD OF MANUFACTURE |
摘要 |
A structure is provided with a metal cap for back end of line (BEOL) interconnects that substantially eliminates electro-migration (EM) damage, a design structure and a method of manufacturing the IC. The structure includes a metal interconnect formed in a dielectric material and a metal cap selective to the metal interconnect. The metal cap includes RuX, where X is at Boron, Phosphorous or a combination of Boron and Phosphorous. |
申请公布号 |
US2012228770(A1) |
申请公布日期 |
2012.09.13 |
申请号 |
US201213474916 |
申请日期 |
2012.05.18 |
申请人 |
YANG CHIH-CHAO;CHANDA KAUSHIK;EDELSTEIN DANIEL C.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
YANG CHIH-CHAO;CHANDA KAUSHIK;EDELSTEIN DANIEL C. |
分类号 |
H01L23/482;B82Y99/00 |
主分类号 |
H01L23/482 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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