| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition for improving line edge roughness (LER), allowing formation of a resist profile with little undercut degree specific to a negative resist composition, and giving high resolution. <P>SOLUTION: A chemically amplified negative resist composition is provided, having such a mechanism that crosslinks are formed among resist polymers by a crosslinking agent and/or a repeating unit having a crosslinking functional group in a resist polymer while an acid generating by irradiation with high energy beams acts as a catalyst and that the composition is changed into insoluble with an alkaline developing solution. The resist polymer contains repeating units of (1) a (meth)acrylic acid ester unit having an acid generating group in a side chain, (2) a (meth)acrylic acid ester unit having a condensed aromatic ring in a side chain, (3) acenaphthylene unit, and (4) an indene unit, in which the repeating unit (1) is included by 0.5 to 10 mol% and other repeating units in total is included by 50 to 99.5 mol%. <P>COPYRIGHT: (C)2012,JPO&INPIT |
