| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a susceptor cover in which there is no risk of cracking caused by thermal stress and which is suitable for automatic conveyance, and a vapor-phase growth apparatus equipped with the susceptor cover. <P>SOLUTION: A susceptor cover 1 is installed in a susceptor 27 in a vapor-phase growth apparatus 17 which is installed inside a chamber 23 so as to be revolved, and has a plurality of substrate placing parts 47 in each of which a substrate 25 to deposit a thin film thereon is placed so as to revolve. The susceptor cover 1 has an outer form which is circular, and is configured by providing openings 5 continuously in a circumferential direction, in portions corresponding to the substrate placing parts 47, and divided into an inner circumferential side 1a and an outer circumferential side 1b in a portion between the adjacent openings 5. The inner circumferential side 1a and the outer circumferential side 1b are engaged by such an engaging part 7 that, when any one of the inner circumferential side 1a and the outer circumferential side 1b is carried up, the other is also carried up. <P>COPYRIGHT: (C)2012,JPO&INPIT |
