POLYSILANESILOXANE RESINS FOR USE IN AN ANTIREFLECTIVE COATING
摘要
<p>Polysilanesiloxane copolymers or resins and method of making are provided. The present disclosure further provides a method of applying the polysilanesiloxane copolymers onto a substrate to form a polysilanesiloxane film for use in photolithography (193 nm). The polysilanesiloxane films meet the basic performance criteria expected or desired for use in an antireflection coating (ARC) application,</p>
申请公布号
WO2012122342(A1)
申请公布日期
2012.09.13
申请号
WO2012US28208
申请日期
2012.03.08
申请人
DOW CORNING CORPORATION;ZHOU, XIAOBING;MOYER, ERIC S.