| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a drawing apparatus which is advantageous in reliability and throughput when drawing a pattern of a specific design rule. <P>SOLUTION: A drawing apparatus which draws a pattern to be arranged on a straight line extending in a first direction with a plurality of charged particle beams on a substrate includes projection systems (1 to 7 and 9) for projecting the plurality of charged particle beams on the substrate, scan means (8 and 11) which performs relative scanning between the plurality of charged particle beams and the substrate in the first direction and a second direction orthogonal to the first direction, and control means (13 to 16) which controls the relative scan by the scan means and controls the irradiation of the plurality of charged particle beams to the substrate with the projection systems at first intervals in the first direction and at second intervals in the second direction. In the drawing apparatus, the size of the charged particle beams projected on the substrate by the projection systems in the first direction is made different from that of the charged particle beams in the second direction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
