发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device includes: diffusion layers formed at the front surface of a substrate; low-resistance parts formed at the front surfaces of the diffusion layers so as to have resistance lower than the diffusion layer; and rear contact electrodes passing through the substrate from the rear surface of the substrate to be connected to the low-resistance parts through the diffusion layers.
申请公布号 US2012231620(A1) 申请公布日期 2012.09.13
申请号 US201213475365 申请日期 2012.05.18
申请人 KURODA HIDEAKI;SONY CORPORATION 发明人 KURODA HIDEAKI
分类号 H01L21/28 主分类号 H01L21/28
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