发明名称 |
Novel Etching Composition |
摘要 |
This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.
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申请公布号 |
US2012231632(A1) |
申请公布日期 |
2012.09.13 |
申请号 |
US201213415390 |
申请日期 |
2012.03.08 |
申请人 |
TAKAHASHI TOMONORI;INABA TADASHI;MIZUTANI ATSUSHI;DU BING;WOJTCZAK WILLIAM A.;TAKAHASHI KAZUTAKA;KAMIMURA TETSUYA;FUJIFILM CORPORATION;FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. |
发明人 |
TAKAHASHI TOMONORI;INABA TADASHI;MIZUTANI ATSUSHI;DU BING;WOJTCZAK WILLIAM A.;TAKAHASHI KAZUTAKA;KAMIMURA TETSUYA |
分类号 |
H01L21/306;C09K13/00;C09K13/06 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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