| 摘要 |
<p>A plasma generating apparatus (20) is provided with: a microwave generating apparatus (21), which generates microwaves; a rectangular waveguide (22), which is connected to the microwave generating apparatus (21), and is provided with an antenna section (40) as a part of the rectangular waveguide; a gas supply apparatus (23), which is connected to the rectangular waveguide (22), and supplies a processing gas to the inside of the rectangular waveguide; an air-release apparatus (24) for releasing a gas from the antenna section (40) and, if necessary, air from the inside of a processing container (10); and a phase shift apparatus (25A), which changes the phase of a standing wave in the rectangular waveguide (22). The antenna section (40) has a slot hole (41), brings the processing gas into the plasma state using microwaves, said processing gas having been supplied to the inside of the rectangular waveguide (22) in the atmospheric state, and discharges, from the slot hole (41), the plasma toward an external subject to be processed.</p> |
