| 摘要 |
To provide a method by which productivity and product qualities can be improved by eliminating contamination of products and contamination in a film-forming system at the time of a release to the atmosphere after film formation is stopped, in functional film manufacture wherein films are formed using plasma CVD, while transferring long substrates in the longitudinal direction. After having the surface of a film-forming electrode in a state where the surface is prevented from being in contact with the atmosphere in a film-forming system, a gas for the release to the atmosphere is introduced into the film-forming system, thereby solving the above-mentioned issue. |
