发明名称 |
SURFACE WAVE PLASMA GENERATING ANTENNA AND SURFACE WAVE PLASMA PROCESSING APPARATUS |
摘要 |
<p>PURPOSE: An antenna for generating surface wave plasma and a plasma processing apparatus are provided to form plasma uniformity of a circumferential direction by preventing the reduction of intensity of electromagnetic waves in a region where there is no slot in a slot joint portion. CONSTITUTION: An antenna(81) for generating surface wave plasma has a disc shape. The antenna has six slots(121) which are formed into a circumferential shape. The slots have equal circular arc shapes. The slots have a central portion(121a) forming a thick circular arc shape, a first end portion(121b), and a second end portion(121c). The first end portion is extended from the outside of one circumferential direction end portion on one side of the central portion to a circumferential direction. The second end portion is extended from the inside of the circumference direction end portion on the other side of the central portion to the circumferential direction.</p> |
申请公布号 |
KR20120100794(A) |
申请公布日期 |
2012.09.12 |
申请号 |
KR20120021712 |
申请日期 |
2012.03.02 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
IKEDA TARO;KASAI SHIGERU;OSADA YUKI |
分类号 |
H05H1/46;H01L21/205;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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