发明名称 |
Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern |
摘要 |
<p>There is provided a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied photosensitive resin composition; (3) an exposure step of patternwise exposing the photosensitive resin composition from which the solvent has been removed, to an active radiation; (4) a development step of developing the exposed photosensitive resin composition using an aqueous developer liquid; (5) an overcoating step of providing an overcoat layer on the developed photosensitive resin composition; (6) a heat-treating step of heat-treating the photosensitive resin composition on which the overcoat layer has been provided; and (7) a removal step of removing the overcoat layer.</p> |
申请公布号 |
EP2498133(A2) |
申请公布日期 |
2012.09.12 |
申请号 |
EP20120158216 |
申请日期 |
2012.03.06 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
ANDOU, TAKESHI;FUJIMORI, JUNICHI;YONEZAWA, HIROYUKI;KAWABE, YASUMASA;NAKAMURA, HIDEYUKI |
分类号 |
G03F7/40 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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