| 摘要 |
PURPOSE: A photo mask, a pattern transferring method, and a pellicle are provided to secure different wavelength selecting functions in each photo mask and to improve the resolution of transferred patterns. CONSTITUTION: A photo mask includes a transparent substrate, transferred patterns(2) on the transparent substrate, and a wavelength selecting unit(3). The wavelength selecting unit reflects light in a pre-determined wavelength of exposure light, with which the photo mask is irradiated, in order to reduce the transmitting amount of light through the photo mask. The wavelength selecting unit is composed of a dielectric multi-layered film. A plurality of dielectric layers with different refractive indexes is stacked to form the dielectric multi-layered film. The pre-determined wavelength includes g-line or h-line. |
