| 摘要 |
PURPOSE: An operating method of UV irradiation for substrate processing, a substrate processing method, and an UV unit for substrate processing are provided to reduce misadjustment caused by environmental or external factors of control by measuring illumination using a built-in ultraviolet sensor and an exterior ultraviolet sensor. CONSTITUTION: An UV lamp(2) is provided in order to process a substrate. An UV feedback sensor(3) provides a feedback to a power control system. A PLC(Power Line Communication) part(4) controls the power of the UV lamp. A second ultraviolet sensor(21) functions as an UV control sensor. A heater table(5) is provided in order to support the substrate. [Reference numerals] (3,21) Controlling; (4) PLC; (AA) Power control; (BB) Illumination intensity feedback
|
