发明名称 |
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND METHOD OF IMPROVING A MATHEMATICAL MODEL OF A LITHOGRAPHIC PROCESS. |
摘要 |
A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter. |
申请公布号 |
NL2008285(A) |
申请公布日期 |
2012.09.12 |
申请号 |
NL20122008285 |
申请日期 |
2012.02.14 |
申请人 |
ASML NETHERLANDS B.V., NULL |
发明人 |
ENGELEN, ADRIANUS;MEGENS, HENRICUS;MULKENS, JOHANNES;KAZINCZI, ROBERT;WANG, JEN-SHIANG |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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