| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-sensitivity, high-resolution, high-heat resistant, and solvent-soluble non-polymeric radiation-sensitive resist by a simple production process. <P>SOLUTION: The composition containing a compound represented by a specific formula and an acid-generating agent is sensitive to radiations such as an excimer laser beam of KrF or the like, an electron beam, an extreme ultraviolet light (EUV) and X-ray, and can form a high-sensitivity, high-resolution, high-heat resistant, and solvent-soluble non-polymeric radiation-sensitive resist by a simple production process. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
