| 摘要 |
PURPOSE: A plasma processing apparatus and method are provided to precisely control plasma density distribution in doughnut shaped phase plasma which is generated by inductive coupling and the plasma density distribution on the substrate. CONSTITUTION: An RF antenna installed on a dielectric window(52) is divided into an inner coil(58), a middle coil(60), and an external coil(62) in a diameter direction. The inner coil is located in the center of a chamber in the diameter direction. A RF inlet end portion of the inner coil is connected to an RF feeding line(68) of a high frequency feeding unit(66) by interposing a connection conductor(92) and a first node. An RF output end portion of the inner coil is connected to an earth line(70). The RF inlet end portion of the middle coil contacts the RF feeding line of the high frequency feeding unit and the RF inlet end portion of the inner coil. The external coil is located on a sidewall of the chamber outward the middle coil. |
