| 摘要 |
The present invention provides an exposure apparatus in which a photo mask having a plurality of openings, each having a predetermined shape, formed in a light shielding film mounted on one surface of a transparent substrate 9 is disposed proximately and oppositely to a subject 6 to be exposed, and patterns corresponding to the openings are formed by exposure on the subject to be exposed by irradiating the photo mask with a light beam L1 from a light source, in which a plurality of micro lenses for forming images of the openings on the subject to be exposed are disposed on the side of the subject to be exposed in such a manner as to correspond to the openings of the photo mask. |
