发明名称 Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
摘要 A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
申请公布号 US8264664(B2) 申请公布日期 2012.09.11
申请号 US20080269390 申请日期 2008.11.12
申请人 VAN DER SCHAAR MAURITS;BURGHOORN JACOBUS;VAN HAREN RICHARD JOHANNES FRANCISCUS;MOS EVERHARDUS CORNELIS;MONSHOUWER RENE;ASML NETHERLANDS B.V. 发明人 VAN DER SCHAAR MAURITS;BURGHOORN JACOBUS;VAN HAREN RICHARD JOHANNES FRANCISCUS;MOS EVERHARDUS CORNELIS;MONSHOUWER RENE
分类号 G03B27/52;G03B27/42 主分类号 G03B27/52
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