发明名称 |
Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method |
摘要 |
A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker. |
申请公布号 |
US8264664(B2) |
申请公布日期 |
2012.09.11 |
申请号 |
US20080269390 |
申请日期 |
2008.11.12 |
申请人 |
VAN DER SCHAAR MAURITS;BURGHOORN JACOBUS;VAN HAREN RICHARD JOHANNES FRANCISCUS;MOS EVERHARDUS CORNELIS;MONSHOUWER RENE;ASML NETHERLANDS B.V. |
发明人 |
VAN DER SCHAAR MAURITS;BURGHOORN JACOBUS;VAN HAREN RICHARD JOHANNES FRANCISCUS;MOS EVERHARDUS CORNELIS;MONSHOUWER RENE |
分类号 |
G03B27/52;G03B27/42 |
主分类号 |
G03B27/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|