发明名称 Method for measuring plasma formation time
摘要 PURPOSE: A method for measuring time for forming plasma is provided to easily grasp time for forming plasma by injecting laser at predetermined time intervals without expensive devices. CONSTITUTION: A method for measuring time for forming plasma is as follows. A hydrophobic coating layer is formed on a substrate(S100). A target measuring substance is evaporated on the hydrophobic coating layer(S200). Laser is irradiated on the surface in the opposite side of the surface where the hydrophobic coating layer is formed(S300). Whether the size of patterns where the hydrophobic coating layer is removed is larger than or same as a focal point of laser is checked(S400). When the size of patterns where the hydrophobic coating layer is removed is larger than the focal point of the laser, a point where the size of patterns becomes same as the focal point is grasped while gradually reducing the pulse width of the laser. When the size of patterns where the hydrophobic coating layer is removed is same as the focal point of the laser, a point where the size of patterns becomes larger than the focal point is grasped while gradually increasing the pulse width of the laser. The pulse width at the caught point is calculated to time when the plasma is formed by the laser(S600).
申请公布号 KR101181307(B1) 申请公布日期 2012.09.11
申请号 KR20110011502 申请日期 2011.02.09
申请人 发明人
分类号 B23K26/0622;G01N21/00;H05K3/00 主分类号 B23K26/0622
代理机构 代理人
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