发明名称 Aromatic vinyl ether based reverse-tone step and flash imprint lithography
摘要 A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
申请公布号 US8262961(B2) 申请公布日期 2012.09.11
申请号 US20080055513 申请日期 2008.03.26
申请人 DIPIETRO RICHARD ANTHONY;HART MARK WHITNEY;HOULE FRANCES ANNE;ITO HIROSHI;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DIPIETRO RICHARD ANTHONY;HART MARK WHITNEY;HOULE FRANCES ANNE;ITO HIROSHI
分类号 B29C41/20;B29C41/22;B29C59/02;B29C59/16 主分类号 B29C41/20
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