发明名称 |
Aromatic vinyl ether based reverse-tone step and flash imprint lithography |
摘要 |
A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate. |
申请公布号 |
US8262961(B2) |
申请公布日期 |
2012.09.11 |
申请号 |
US20080055513 |
申请日期 |
2008.03.26 |
申请人 |
DIPIETRO RICHARD ANTHONY;HART MARK WHITNEY;HOULE FRANCES ANNE;ITO HIROSHI;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DIPIETRO RICHARD ANTHONY;HART MARK WHITNEY;HOULE FRANCES ANNE;ITO HIROSHI |
分类号 |
B29C41/20;B29C41/22;B29C59/02;B29C59/16 |
主分类号 |
B29C41/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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