Opto-electronic and electronic devices using an N-face or M-plane gallium nitride substrate prepared via ammonothermal growth

摘要

A method for growing III-V nitride films having an N-face or M-plane using an ammonothermal growth technique. The method comprises using an autoclave, heating the autoclave, and introducing ammonia into the autoclave to produce smooth N-face or M-plane Gallium Nitride films and bulk GaN.