发明名称 |
Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography |
摘要 |
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques. |
申请公布号 |
US8263129(B2) |
申请公布日期 |
2012.09.11 |
申请号 |
US20040583570 |
申请日期 |
2004.12.20 |
申请人 |
DESIMONE JOSEPH M.;ROLLAND JASON P.;MAYNOR BENJAMIN W.;EULISS LARKEN E.;ROTHROCK GINGER DENISON;DENNIS ANSLEY E;SAMULSKI EDWARD T.;SAMULSKI R. JUDE;THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL |
发明人 |
DESIMONE JOSEPH M.;ROLLAND JASON P.;MAYNOR BENJAMIN W.;EULISS LARKEN E.;ROTHROCK GINGER DENISON;DENNIS ANSLEY E;SAMULSKI EDWARD T.;SAMULSKI R. JUDE |
分类号 |
A61K9/14;A61K9/00;A61K9/51;B28B11/08;G03F7/00;H01L21/02;H01L51/00;H01L51/40 |
主分类号 |
A61K9/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|