发明名称 Method for forming a circuit pattern
摘要 A method for forming a circuit pattern is disclosed. A circuit pattern that forms an electrically conductive layer (2L) is formed on an insulating resin (11) that forms a first insulating layer (1L). An insulating resin (13) that forms a second insulating layer (3L) is laminated on the insulating resin (11) on which the circuit pattern has been formed. A trench (14) is formed in the laminated insulating resin (13) to expose the circuit pattern. An electroless plating metal (15) is buried by electroless plating in the trench (14) formed.
申请公布号 US8262831(B2) 申请公布日期 2012.09.11
申请号 US20080738794 申请日期 2008.10.03
申请人 HASHIMOTO SHIGEO;HOTTA TERUYUKI;ISHIZAKI TAKAHIRO;C. UYEMURA & CO., LTD. 发明人 HASHIMOTO SHIGEO;HOTTA TERUYUKI;ISHIZAKI TAKAHIRO
分类号 B29C65/00;B32B37/00;B32B38/10;B32B38/14 主分类号 B29C65/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利