发明名称 |
Method for forming a circuit pattern |
摘要 |
A method for forming a circuit pattern is disclosed. A circuit pattern that forms an electrically conductive layer (2L) is formed on an insulating resin (11) that forms a first insulating layer (1L). An insulating resin (13) that forms a second insulating layer (3L) is laminated on the insulating resin (11) on which the circuit pattern has been formed. A trench (14) is formed in the laminated insulating resin (13) to expose the circuit pattern. An electroless plating metal (15) is buried by electroless plating in the trench (14) formed. |
申请公布号 |
US8262831(B2) |
申请公布日期 |
2012.09.11 |
申请号 |
US20080738794 |
申请日期 |
2008.10.03 |
申请人 |
HASHIMOTO SHIGEO;HOTTA TERUYUKI;ISHIZAKI TAKAHIRO;C. UYEMURA & CO., LTD. |
发明人 |
HASHIMOTO SHIGEO;HOTTA TERUYUKI;ISHIZAKI TAKAHIRO |
分类号 |
B29C65/00;B32B37/00;B32B38/10;B32B38/14 |
主分类号 |
B29C65/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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